Consistent production from mask manufacturing to patterning "Patterning"
Can accommodate processing of a small number of pieces. Substrates other than silicon wafers can be used.
We primarily focus on 6-inch MEMS processing, but we can also accommodate partial patterning for 8-inch and 12-inch wafers. We select equipment based on the substrate size and pattern specifications. We can handle orders starting from just one piece. We support photolithography (aligner, KrF, EB), wet etching, milling, and RIE. We also accommodate substrates other than silicon, so please feel free to consult with us. For more details, please download the catalog or contact us.
- Company：大村技研
- Price：Other
